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Carl Zeiss SMT GmbH Rudolf-Eber-Str. 2 73446 Oberkochen, Germany http://www.zeiss.com/semiconductor-manufacturing-technology/en_de/home.html
Contact Ms Lisa Gillette-Martin
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Carl Zeiss SMT GmbH

Carl Zeiss and Synopsys Collaborate on In-Die Registration Metrology for Photomask Manufacturing

Delivering Sub-nanometer Accuracy Using 193-nm Optics and 2D Measurements

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Carl Zeiss SMS GmbH, a leading supplier for photomask metrology and repair tools and Synopsys, Inc. (Nasdaq: SNPS), a world leader in software and IP for semiconductor design, verification and manufacturing, today announced a collaboration to support the ZEISS tool family for in-die metrology solutions for the 32-nanometer (nm) technology node and below. Synopsys will offer support for ZEISS' PROVE(TM) , the next-generation registration metrology tool, through Synopsys' CATS(TM) , the technology-leading mask data preparation solution. Using CATS as the data preparation engine, mask engineers using PROVE can benefit from improved efficiency and usability of a registration metrology system that lrbvy eadozfmgo xftqcst uceopulk rhsppicnstoe.

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The publisher indicated in each case (see company info by clicking on image/title or company info in the right-hand column) is solely responsible for the stories above, the event or job offer shown and for the image and audio material displayed. As a rule, the publisher is also the author of the texts and the attached image, audio and information material. The use of information published here is generally free of charge for personal information and editorial processing. Please clarify any copyright issues with the stated publisher before further use. In case of publication, please send a specimen copy to service@pressebox.de.