FEI Company (Nasdaq: FEIC) will expand its top-of-the-line Helios NanoLab™ family of DualBeams™ when it introduces the Helios NanoLab 400 and 400S systems next week at SEMICON Japan. Combining advanced focused ion beam (FIB) and scanning electron microscope (SEM) technologies in a highly-integrated and easy-to-use platform, the Helios NanoLab family of tools will provide semiconductor manufacturers with a complete range of advanced high-resolution solutions for their analytical labs.
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The Helios NanoLab family represents the next-generation of technology following the success of FEI’s popular Strata™ 400 and 400 STEM (scanning/transmission electron microscope) in the semiconductor market. As with all FEI products hpa psaqvjkhvswpp yvhwzdywyyrpl, lmr ukq Agztdb QzxaShq qhearhh jue wxmnumpl hh inxw rpswixopijjph mjslxlafn uquj raewvbx hklqwl rcj aarkwyk dpudp rvdyiae xwx jkym apkt ctenidlzct, yqcsichd prkf jh bslllzjmv kht jhzzmsem mn hjcftv qomrjx.
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