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Fraunhofer-Institut für Photonische Mikrosysteme (IPMS) Maria-Reiche-Str. 2 01109 Dresden, Germany https://www.ipms.fraunhofer.de
Contact Mr Moritz Fleischer +49 351 8823249
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Fraunhofer-Institut für Photonische Mikrosysteme (IPMS)

Imprintlithographie am Fraunhofer IPMS: Entwicklung und Volumenproduktion für nanophotonische Bauelemente und Systeme

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Die Strukturen in Halbleiterbauelementen werden immer kleiner - so klein, dass sie in Zukunft nicht mehr durch Belichtungsverfahren erzeugt werden können, weil die Wellenlänge des Lichts sogar im UV-Bereich zu "grob" dafür ist. Heutige Lithografiesysteme nutzen Excimer-Laser mit einer Lichtwellenlänge von 193 nm, um kommerzielle Schaltkreise mit einer minimalen Strukturgröße von 35 nm zu produzieren. Das Rennen um die geeignete Methode für die weitere Miniaturisierung in der Lithografie mit minimalen Strukturgrößen von 22 nm ist noch offen.

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The publisher indicated in each case (see company info by clicking on image/title or company info in the right-hand column) is solely responsible for the stories above, the event or job offer shown and for the image and audio material displayed. As a rule, the publisher is also the author of the texts and the attached image, audio and information material. The use of information published here is generally free of charge for personal information and editorial processing. Please clarify any copyright issues with the stated publisher before further use. In case of publication, please send a specimen copy to service@pressebox.de.